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Microbeam pull-in voltage topology optimization including material deposition constraint

机译:包括材料沉积约束的微束引入电压拓扑优化

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摘要

Because of the strong coupling between mechanical and electrical phenomena existing in electromechanical microdevices, some of them experience, above a given driving voltage, an unstable behavior called pull-in effect. The present paper investigates the application of topology optimization to electromechanical microdevices for the purpose of delaying this unstable behavior by maximizing their pull-in voltage. Within the framework of this preliminary study, the pull-in voltage maximization procedure is developed on the basis of electromechanical microbeams reinforcement topology design problem. The proposed sensitivity analysis requires only the knowledge of the microdevice pull-in state and of the first eigenmode of the tangent stiffness matrix. As the pull-in point research is a highly non-linear problem, the analysis is based on a monolithic finite element formulation combined with a normal flow algorithm (homotopy method). An application of the developed method is proposed and the result is compared to the one obtained using a linear compliance optimization. Moreover, as the results provided by the developed method do not comply with manufacturing constraints, a deposition process constraint is added to the optimization problem and its effect on the final design is also tested.
机译:由于机电微型设备中存在的机械现象和电气现象之间的强耦合,因此,在给定的驱动电压以上,它们中的一些会经历不稳定的行为,称为拉入效应。本文研究了拓扑优化在机电微器件中的应用,目的是通过最大化其吸合电压来延迟这种不稳定行为。在此初步研究的框架内,基于机电微梁增强拓扑设计问题开发了引入电压最大化程序。提出的灵敏度分析仅需要了解微设备的拉入状态和切线刚度矩阵的第一本征模。由于引入点研究是一个高度非线性的问题,因此分析是基于整体有限元公式与常规流算法(同伦方法)相结合的。提出了一种开发方法的应用,并将结果与​​使用线性顺应性优化获得的结果进行比较。此外,由于所开发方法提供的结果不符合制造约束,因此将沉积工艺约束添加到优化问题中,并且还测试了其对最终设计的影响。

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